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Rapid Thermal Processing and beyond: Applications in Semiconductor Processing

Materials Science Forum Volumes 573 - 574

• Papers
• Abstracts

• p305 Ultra-Shallow Junction Formation Using Rapid Thermal Processing   [ 511 K ]
  Authors: Amitabh Jain
• p319 Ultra-Rapid Thermal Process for ULSIs   [ 2 M ]
  Authors: Kyoichi Suguro
• p325 Advanced Millisecond Annealing Technologies and its Applications and Concerns on Advanced Logic LSI Fabrication Processes   [ 523 K ]
  Authors: Masataka Kase, Tomonari Yamamoto, Tomohiro Kubo
• p333 Doping Strategies for FinFETs   [ 2 M ]
  Authors: Bartek J. Pawlak, Ray Duffy, An De Keersgieter
• p341 RTP Requirements for CMOS Integration of Dual Work Function Phase Controlled Ni-FUSI (Fully Silicided) Gates with Simultaneous Silicidation of nMOS (NiSi) and pMOS (Ni-Rich Silicide) Gates on HfSiON   [ 1 M ]
  Authors: Anne Lauwers, Jorge Kittl, Karen Maex
• p355 A Short History of Pattern Effects in Thermal Processing   [ 548 K ]
  Authors: Paul J. Timans
• p375 Conduction Heating in RTP Fast, and Pattern-Independent   [ 1 M ]
  Authors: Ernst Granneman
• p387 Advanced Annealing Schemes for High-Performance SOI Logic Technologies   [ 515 K ]
  Authors: Thomas Feudel
• p403 Model Based Measurement in Advanced Rapid Thermal Processing   [ 287 K ]
  Authors: Christoph Merkl, Rolf Bremensdorfer
• p417 Short Time Thermal Processing: From Electronics via Photonics to Pipe Organs of the 17^th Century   [ 384 K ]
  Authors: Wolfgang Skorupa