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Fabrication Of Nd:YVO4 Thin Film Waveguide Grown on Si/SiO2 by Pulsed Laser Deposition

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Abstract:

High quality Nd:YVO4 thin films were fabricated successfully by using a pulsed laser deposition technique. The properties of the samples were characterized by using X-ray diffraction, atomic force microscopy, and prism-coupling measurements. According to above discussion, we concluded the optimal preparation conditions for Nd:YVO4 films prepared on Si/SiO2 substrates.

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Periodical:

Key Engineering Materials (Volumes 373-374)

Pages:

142-145

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.373-374.142

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Online since:

March 2008

Authors:

Hong Xia Li, Ren Guo Song, Xin Wu, Ji Yang Wang

Keywords:

Atomic Force Microscope (AFM), Laser Deposition, Thin Film, X-Ray Diffraction (XRD)

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© 2008 Trans Tech Publications Ltd. All Rights Reserved

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