Paper Titles
Adhesion Studies of Diamond-Like Carbon Films on 202 Stainless Steel Substrate with a Silicon Interlayer
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Study on Interfacial Bonding Strength of TiN Films Prepared by Magnetron Sputtering at Low Temperature
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Rf Sputtering of Composite Fluorocarbon/ZnO Films and their Basic Properties
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Effect of Yttrium(Y) Content in Al Target on the Thickness of CrAlTiN Film by Magnetron Sputtering
p.163
Effects of Substrate Bias Voltage on the Microstructure of Cr-Al-N Coatings
p.167
Effect of Low-Energy Ion Irradiation on Synthesis of Hard and Superhard Films
p.172
The Microstructure and Properties of CrNx Films Synthesized by Unbalanced Magnetron Sputtering
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Microstructure and Properties of TiC Coating by Vibrating Electrospark Deposition
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Effects of Incident Angle on Microstructure of Ni-Cr Film Deposited by PVD
p.184

Effects of Substrate Bias Voltage on the Microstructure of Cr-Al-N Coatings

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Abstract:

Cr-Al-N coatings with the thickness of about 2 μm have been prepared by a reactive magnetron sputtering method. The effects of substrate negative bias voltage (VB) on the microstructure and critical failure load have been investigated as the VB varied from 0 to –150 V. With VB increasing, grain size, lattice parameter and microstrain increase. (111) preferred orientation dominates in the coatings deposited under 0 and –50 V, while a (200) preferred orientation developed when VB further raised. The reasons for these variation caused by VB are discussed.

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Periodical:

Key Engineering Materials (Volumes 373-374)

Pages:

167-171

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.373-374.167

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Online since:

March 2008

Authors:

Ming Zhu, Shu Wang Duo, Tian Peng Li, Mei Shuan Li, Yan Chun Zhou

Keywords:

Cr-Al-N Coatings, Magnetron Sputtering, Substrate Bias Voltage

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© 2008 Trans Tech Publications Ltd. All Rights Reserved

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