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Optical Emission Spectroscopy Study of Magnetron Assisted Ni-Ti DC Sputtering

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Abstract:

Ni-Ti thin films where the R-phase transformation occurs between 55°C and 30°C, the peak temperature being 40°C, have been produced. These thin films have been grown using a magnetron assisted system of dc sputtering, with a Glow-Discharge Optical Emission Spectroscopy device. The OES technique has been used to investigate the spatial distribution of sputtered atoms from the cathode to the substrate in different operating conditions: Argon pressure of 5 and 9x10 – 4 Torr, without polarization and with – 60 V bias. Structural characterization of the thin films has been made by XRD and the transformation temperatures associated to the shape memory effect have been determined by DSC. A discussion of the optimization of the processing parameters (Argon pressure and polarization) is then presented.

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Periodical:

Materials Science Forum (Volumes 514-516)

Pages:

1274-1278

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.514-516.1274

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Online since:

May 2006

Authors:

Marcia Silva, Paulo R. Gordo, Manuel J.P. Maneira, Francisco Manuel Braz Fernandes

Keywords:

Optical Emission Spectroscopy, Shape Memory Alloy Actuator, Thin Film

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© 2006 Trans Tech Publications Ltd. All Rights Reserved

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References

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