Modification of the Curing Characteristics of the Photocurable Resin FA1260T for 3D Microfabrication Using Microstereolithography

Article Preview

Abstract:

The curing characteristics of a photocurable resin are critical factors that often decide the ultimate resolution and structural sharpness of a final product fabricated by microstereolithography (μ-STL). In this study, we investigated the curing characteristics of the FA1260T photopolymer under a visible laser light of 442nm wavelength. Modification of the curing property of the FA1260T is attempted to reduce the cure depth (Dc) by adding a radical quencher to the resin. Also, an organic solvent was used to reduce the resin viscosity for an improvement of the flatness of the liquid surface during layer-by-layer curing. As a result, the minimum Dc has been reduced over a factor of 3 with no abrupt increase. Samples of three dimensional microstructures fabricated using the modified FA1260T are presented.

You might also be interested in these eBooks

Info:

Periodical:

Key Engineering Materials (Volumes 326-328)

Pages:

107-110

Citation:

Online since:

December 2006

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2006 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

[1] K, Ikuta and K. Hirowatari: Proc. IEEE MEMS, (1993), pp.42-47.

Google Scholar

[2] T. Katagi and N. Nakajima: Proc. IEEE MEMS, (1993), pp.173-178.

Google Scholar

[3] K. Ikuta, S. Maruo and S. Kojima: Proc. IEEE MEMS, (1998), pp.290-295.

Google Scholar

[4] P. G. Conrad II, P. T. Nishmura, D. Aherne, B. J. Schwartz, D. Wu, N. Fang, X. Zhang, J. Roberts, and K. J. Sha: Adv. Mater. Vol. 15, No. 18, September 16 (2003), pp.1541-1544.

Google Scholar

[5] S. M. Kuebler, M. Rumi, T. Watanabe, K. Braun, B. H. Cumpston, A. A. Heikal, L. L. Erskine, S. Thayumanavan, S. Barlow, S. Marder and J. W. Perry: J. Photopolym. Sci. Tech., Vol. 14(4) (2001), pp.657-668.

DOI: 10.2494/photopolymer.14.657

Google Scholar

[6] M. Farsari, S. Huang, R. C. D. Young, M. I. Heywood, P. J. B. Morrell and C. R. Chatwin: J. Photochem. Photobiol. A: Chem. Vol. 115 (1998), pp.81-87.

Google Scholar

[7] H. B. Sun and S. Kawata: J. Lightwave Tech. Vol. 21 (2003), pp.624-633.

Google Scholar

[8] K, Takada, H. B. Sun and S, Kawata: Appl. Phys. Lett. Vol. 86 (2005), p.071122.

Google Scholar

[9] S. S. Cutie, D. E. Henton, C. Powell, R. E. Reim, P. B. Smith, and T. L. Staples: J. Appl. Polym. Sci. Vol. 64 (1997), pp.577-589 ��wP�.

Google Scholar