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The Analysis of Focused Ion Beam Processing Characteristics for Micro Mold Fabrication

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Abstract:

FIB equipment has the ability to perform etching and chemical vapor deposition simultaneously. It is very advantageously used to fabricate micro structure components having 3D shape because it has a minimum beam size of Φ 10nm and smaller. Currently, FIB technology has been studied the research fields relating to two problems such as low accuracy and low productivity due to redeposition and a charging effect. This paper focuses on applying FIB technology to the field of micro mold fabrication and repair. As such, the simple micro pattern fabrication techniques and the experimental characteristics are studied on FIB-CVD according to ion beam condition and scanning area. We have encountered some remarks that the result of the experiments according to beam current of 8 pA, shows superior CVD yield. But the result of 1318 pA shows the pattern etched off. Furthermore, we also analyzed the scanning area effect for FIB-CVD yield and suggest the maximum yield condition of the chemical vapor deposition for micro part fabrication.

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Periodical:

Key Engineering Materials (Volume 329)

Pages:

649-654

DOI:

https://doi.org/10.4028/www.scientific.net/KEM.329.649

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Cite this paper

Online since:

January 2007

Authors:

Hon Jong Choi, E.G. Kang, W.P. Hong, Seok Woo Lee, Young Jae Choi

Keywords:

CVD Process, Etching Process, Focused Ion Beam (FIB), Micro Mold Fabrication

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© 2007 Trans Tech Publications Ltd. All Rights Reserved

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