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Parameters Optimization on the Lapping Process for Advanced Ceramics by Applying Taguchi Method
Abstract:
The surface quality is a critical factor affecting the performance and reliability of advanced ceramics. This paper focuses on the application of Taguchi method for optimization of advanced ceramics lapping process parameters to obtain the best finish. An optimization experiment for lapping silicon wafer with Al2O3 was designed by Taguchi method. Surface roughness Ra and Rt are considered as criteria for optimization. Influence of parameters involving load, speed, and slurry concentration for a given workmaterial with given abrasive (material and size) are discussed, and the optimum lapping conditions are figured out. Compared with single parameter experimental results, it illustrates that the experiment design based on Taguchi method can successfully applied to determine the optimum processing conditions for advanced ceramics lapping process.
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488-491
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December 2006
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© 2006 Trans Tech Publications Ltd. All Rights Reserved
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