Parameters Optimization on the Lapping Process for Advanced Ceramics by Applying Taguchi Method

Article Preview

Abstract:

The surface quality is a critical factor affecting the performance and reliability of advanced ceramics. This paper focuses on the application of Taguchi method for optimization of advanced ceramics lapping process parameters to obtain the best finish. An optimization experiment for lapping silicon wafer with Al2O3 was designed by Taguchi method. Surface roughness Ra and Rt are considered as criteria for optimization. Influence of parameters involving load, speed, and slurry concentration for a given workmaterial with given abrasive (material and size) are discussed, and the optimum lapping conditions are figured out. Compared with single parameter experimental results, it illustrates that the experiment design based on Taguchi method can successfully applied to determine the optimum processing conditions for advanced ceramics lapping process.

You might also be interested in these eBooks

Info:

Periodical:

Materials Science Forum (Volumes 532-533)

Pages:

488-491

Citation:

Online since:

December 2006

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2006 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

[1] R. Komanduri, D.A. Lucca and Y. Tani: Annals of the CIRP, Vol. 46 (1997), pp.545-596.

DOI: 10.1016/s0007-8506(07)60880-4

Google Scholar

[2] J.L. Yuan, B.H. Lv and Z. W Wang: Materials Science Forum, Vol. 471-472 (2004), pp.473-476.

Google Scholar

[3] G. Taguchi: Taguchi Method-Research and Development (ASI Press, Amercia 1992).

Google Scholar

[4] P.J. Ross: Taguchi Techniques for Quality Engineering (McGraw-Hill, Amercia 1996).

Google Scholar

[5] N. Umehara: International Journal of Machine Tool & Manufacture, Vol. 46 (2006), pp.151-169.

Google Scholar