Silicon Carbide and Related Materials 2006
Materials Science Forum Volumes 556 - 557
doi:10.4028/0-87849-442-1
BL
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p549
XPS Study of the Electronic Properties of the Ce/4H-SiC Interface, and the Formation of the SiO2/Ce2Si2O7/4H-SiC Interface Structure upon Oxidation
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336 K
]
Authors: Morten Kildemo, Ulrike Grossner, B.G. Svensson, S. Raaen
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p555
Control of the Flatband Voltage of 4H-SiC Metal-Oxide Semiconductor (MOS) Capacitors by Co-Implantation of Nitrogen and Aluminum
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359 K
]
Authors: Thomas Frank, Svetlana Beljakowa, Gerhard Pensl, Tsunenobu Kimoto, Valery V. Afanas'ev
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p561
Post-Implantation Annealing of SiC: Relevance of the Heating Rate
[
323 K
]
Authors: Roberta Nipoti
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p567
Achieving Low Sheet Resistance from Implanted P-Type Layers in 4H-SiC Using High Temperature Graphite Capped Annealing
[
364 K
]
Authors: Y. Wang, P.A. Losee, S. Balachandran, I. Bhat, T.P. Chow, Y. Wang, B.J. Skromme, J.K. Kim, E.F. Schubert
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p571
Analysis of the Electrical Activation of P+ Implanted Layers as a Function of the Heating Rate of the Annealing Process
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202 K
]
Authors: Mariaconcetta Canino, Filippo Giannazzo, Fabrizio Roccaforte, Antonella Poggi, Sandro Solmi, Vito Raineri, Roberta Nipoti
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p575
Comparison of Graphite and BN/AlN Annealing Caps for Ion Implanted SiC
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1 M
]
Authors: Kenneth A. Jones, M.C. Wood, T.S. Zheleva, K.W. Kirchner, Michael A. Derenge, A. Bolonikov, Tangali S. Sudarshan, R.D. Vispute, Shiva S. Hullavarad, S. Dhar
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p579
Electrical Properties of N Ion Implanted Layer in 3C-SiC(100) Grown on Self-Standing 3C-SiC Substrate
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238 K
]
Authors: Etsushi Taguchi, Yu Suzuki, Masataka Satoh
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p583
Encapsulating Annealing of N+ Implanted 4H-SiC by Diamond-Like-Carbon Film
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578 K
]
Authors: Shingo Miyagawa, Tomoyuki Suzuki, Takahiro Kudo, Masataka Satoh
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p587
High Temperature Implantation of Aluminum in 4H Silicon Carbide
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77 K
]
Authors: Martin Rambach, Anton J. Bauer, H. Ryssel
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p591
Isochronal Annealing Study of Deep Levels in Hydrogen Implanted p-Type 4H-SiC
[
501 K
]
Authors: Giovanni Alfieri, Tsunenobu Kimoto