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Ion Implantation in Semiconductors

Solid State Phenomena Volumes 1 - 2

• Papers
• Abstracts

• p159 Formation and Optimization of Shallow Junctions by Ion Implantation and Rapid Thermal Annealing for CMOS Application   [ 478 K ]
  Authors: I Wei Wu
• p169 Fabrication of Nanometer Doping Structures by Secondary Implantation   [ 310 K ]
  Authors: H. Jorke
• p177 The Use of Ion Implantation for Lifetime Control in Silicon Devices   [ 318 K ]
  Authors: A. Mogro-Campero
• p187 Silicon Surface and Interface Damage Studies Using Ion Implantation   [ 318 K ]
  Authors: S. Ashok
• p195 Recoil Implantation for Shallow Junction Formation in Silicon   [ 255 K ]
  Authors: Harry L. Kwok
• p203 Defects in SIMOX Structures   [ 288 K ]
  Authors: R.C. Barklie
• p211 A Review of Deep Levels in Donor-Ion Implanted GaAs   [ 1 M ]
  Authors: D.W.E. Allsopp
• p247 Ion Implantation in GaAs   [ 1 M ]
  Authors: S.J. Pearton
• p281 Rapid Isothermal Annealing of Ion Implanted Gallium-Arsenide   [ 2 M ]
  Authors: Sukhdev Singh Gill
• p343 Defects and Doping Effects in CdTe and CulnS₂ by Phosphorus Ion Implantation and Pulsed Electron Beam Annealing   [ 536 K ]
  Authors: H.Y. Ueng, H.L. Hwang