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Plasma Properties, Deposition and Etching

Materials Science Forum Volumes 140 - 142

• Papers
• Abstracts

• p335 Bonding Configuration and Defects in Glow-Discharge Amorphous SiN_x:H Films Deposited at 300°C and 500°C   [ 1 M ]
  Authors: Shin Hasegawa, Y. Amano, L. He, T. Inokuma, Y. Kurata
• p359 Doped Glasses for ULSI-Technology: Integration of Molecular Engineering and Plasma-CVD   [ 923 K ]
  Authors: H. Treichel, J. v. Tomkewitsch, O. Spindler
• p381 Growth Processes and Defect Densities in Hydrogenated Amorphous Silicon Alloys   [ 211 K ]
  Authors: J. Robertson
• p387 Sputter Deposition of Thin Films for High Mobility Poly-Si TFT Fabrication   [ 878 K ]
  Authors: T. Serikawa
• p405 Ion Assisted Thin Film Growth in Dual Microwave/Radio Frequency Plasmas   [ 731 K ]
  Authors: L. Martinu, Michael R. Wertheimer
• p421 High Powered Pulsed Plasma Enhanced Deposition of Thin Film Semiconductor and Optical Materials   [ 795 K ]
  Authors: I.P. Llewellyn, K.J.A. Sheach, R.A. Heinecke
• p439 Plasma-Enhanced Chemical Vapour Deposition of Coatings in the System Ti-B-N   [ 1 M ]
  Authors: J. Laimer, H. Karner, H. Störi, P. Rödhammer
• p457 Plasma-Enhanced Metalorganic Chemical Vapor Deposition for High Temperature Superconducting Thin Film   [ 402 K ]
  Authors: Kenji Ebihara, Tomoaki Ikegami
• p465 Low Pressure and Low Temperature Synthesis of Diamond Films Using Magneto-Microwave Plasma CVD   [ 605 K ]
  Authors: J. Wei, H. Kawarada, Akio Hiraki
• p477 Thermal Plasma Chemical Vapor Deposition   [ 1 M ]
  Authors: J.V.R. Heberlein, E. Pfender