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Trends and New Applications of Thin Films

Materials Science Forum Volumes 287 - 288

• Papers
• Abstracts

• p381 Influence of Plasma Conditions on the Deposition of Superhard Amorphous Carbon Films by Laser and Arc Methods   [ 48 K ]
  Authors: Bernd Schultrich, F.-C. Meyer, H.-J. Scheibe, Th. Witke, H. Ziegele
• p383 Deposition and Characterization of Metal Containing Amorphous Hydrocarbon Films (Me-C:H) Prepared by DC Magnetron Sputtering   [ 162 K ]
  Authors: C. Specht, J. Schroeder, R. Wittorf, M. Grischke, K. Bewilogua
• p389 Correlation between Deposition Rate and Hardness of Remote PECVD Silicon Oxide Films   [ 224 K ]
  Authors: Ch. Bayer, Ph. Rudolf von Rohr
• p393 Study of the Growth Mechanisms and Properties of (Cr,O,N) Films Deposited by Vacuum Arc Evaporation   [ 232 K ]
  Authors: C. Gautier-Picard, J. Machet
• p397 Measurements of the Loss Probability of Nitrogen Atoms versus Temperature on Aluminium   [ 201 K ]
  Authors: L. Lefèvre, Thierry Belmonte, Thierry Czerwiec, Alain Ricard, Henri Michel
• p401 Theoretical Investigations of the Multitarget Reactive Sputtering Process: Application to the Titanium - Chromium - Oxygen System   [ 239 K ]
  Authors: N. Martin, Christophe Rousselot
• p407 On the Use of SNMS for the Manufacture Control of Ag Colloid Containing Sol-Gel Fillms on Glass   [ 208 K ]
  Authors: W. Bock, B. Kutsch, M. Kopnarski, H. Oechsner
• p411 Self Organization of Nanostructures during Surface Segregation of S on Ti   [ 32 K ]
  Authors: Ralf Müller, H. Oechsner
• p413 Direct Writing of Metallic Nanostructures by Means of Metal Colloids   [ 183 K ]
  Authors: Guenter Dumpich, J. Lohau, E.F. Wassermann, M. Winter, M.T. Reetz
• p419 Amorphous and Crystalline States in Thin Films of N₂O   [ 221 K ]
  Authors: N.V. Krainyukova, M.A. Strzhemechny