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Electroceramics in Japan III

Key Engineering Materials Volumes 181 - 182

• Papers
• Abstracts

• p89 Characterization of BaTi_0.91(Hf_0.5,Zr_0.5)_0.09O₃ Films Fabricated by Laser Ablation Technique   [ 194 K ]
  Authors: Hirofumi Kakemoto, S. Fujita, Y. Masuda
• p93 Electrical Properties of SrBi₂Ta₂O₉ (SBT) Thin Film Prepared by Metalorganic Chemical Vapor Deposition   [ 254 K ]
  Authors: N. Nukaga, Hiroshi Funakubo, Kunio Ishikawa, E. Shigeno, Yutaka Sawada
• p101 Microstructure of Zinc Oxide Grown by rf Magnetron Sputtering: Aspect of Oxygen Vacancy   [ 234 K ]
  Authors: Tsuyoshi Ogino, Mamabu Komatsu, Isao Sakaguchi, Shunichi Hishita, Naoki Ohashi, Tadashi Takenaka, Kensuke Oki, Noriyuki Kuwano, Hajime Haneda
• p105 Transparent Conductive Oxide for Solar Cells Having Resistance to High Density Hydrogen Plasma and/or High Temperature   [ 254 K ]
  Authors: Toshio Kamiya, Takashi Komaru, Satoshi Shimizu, Mika Kanbe, Charles M. Fortmann, Isamu Shimizu
• p109 Preparation of Al- and Li-Doped ZnO Thin Films by Sol-Gel Method   [ 210 K ]
  Authors: Shinobu Fujihara, Chikako Sasaki, Toshio Kimura
• p113 Preparation of CuO Thin Films and Their Electrical Conductivity   [ 270 K ]
  Authors: Yutake Ohya, Syouko Ito, Takayuki Ban, Yasutaka Takahashi
• p117 High-TCR Bolometer Thin Films by Sol-Gel Processing   [ 238 K ]
  Authors: Toru Mori, Katsuya Kawano, Naoki Oda
• p121 Thickness and Roughness Analysis on YSZ/Si(001) Epitaxial Films with Ultra Thin SiO₂ Interface by X-Ray Reflectivity   [ 265 K ]
  Authors: Chun Hua Chen, N. Wakiya, Atsushi Saiki, Kazuo Shinozaki, Nobuyasu Mizutani
• p125 Growth and Transport Property of Polycrystalline Silicon Fabricated with Intentional Orientation Control on Glass   [ 240 K ]
  Authors: Toshio Kamiya, Kouichi Nakahata, Toshiyuki Sameshima, Kazuyoshi Ro, Atsushi Suemasu, Charles M. Fortmann, Isamu Shimizu
• p129 Thin Film Metallization for Aluminum Nitride   [ 240 K ]
  Authors: Yoshihiko Imanaka, Anant Agarwal, Kishio Yokouchi