Effect of Sputtering Target Power on Preferred Orientation in nc-TiN/a-SiNx Nanocomposite Thin Films

Article Preview

Abstract:

Nanocrystalline TiN (or nc-TiN) has been imbedded in amorphous silicon nitride (a-SiNx)matrix to form a nanocomposite thin film (nc-TiN/a-SiNx) via magnetron sputtering deposition on silicon wafer. Two important effects of the Si3N4 sputtering target power on the formation of nc-TiN/a-SiNx have been studied: (1) Aside from forming a-SiNx in the matrix, Si atoms also imbed into TiN to form (Ti,Si)N solid solution crystallites. At low target power, the solid solution is substitutional. With increase of power, the amount of silicon “dissolved” in the TiN crystallite increases, and in the meantime, the interstitial components increase which is manifested in the increase in the TiN lattice parameter. (2) The crystallites have a preferred orientation varying with the deposition target power. As conveniently described by the coefficient of texture, the degree of preferred orientation along [111] direction decreases and finally tails off with increase of power. At the same time, the crystallites orient along [200] and [220] direction and eventually [220] direction dominants.

You might also be interested in these eBooks

Info:

Pages:

175-178

Citation:

Online since:

January 2005

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2005 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

[1] S. Veprek and S. Reiprich, Thin Solid Films, 268 (1995) 64.

Google Scholar

[2] Sam Zhang, Deen Sun, Yongqing Fu and Hejun Du, Surf. Coat. Technol., 167 (2003) 113.

Google Scholar

[3] Sam Zhang, Deen Sun and Yongqing Fu, J. Mater. Sci. Technol., V18 (6) (2002) 485.

Google Scholar

[4] B. Cantor and C. M. Allen, Scripta Mater. 44 (2001) (2055).

Google Scholar

[5] A I Gusev, Physics-Uspekhi, 41(1) (1998) 49.

Google Scholar

[6] D. M. Bubb, B. R. Ringeisen and P. W. Wu, J. Appl. Phys., 89(10) (2001) 5739.

Google Scholar

[7] Sam Zhang, Deen Sun, Yongqing Fu and Hejun Du, Thin Solid Films (in press).

Google Scholar

[8] F. Vaz, L. Rebouta, B. Almeida, et al., Surf. Coat. Technol., 120-121 (1999) 166.

Google Scholar

[9] B. H. Park, Y. I. Kim and K. H. Kim, Thin Solid Films, 348 (1999) 210.

Google Scholar

[10] D.M. Lee, J. Mater. Sci. 24 (1989) 4375.

Google Scholar

[11] M.I. Jones, I.R. McColl, D.M. Grant, Surf. Coat. Technol. 132 (2000) 143.

Google Scholar

[12] H.E. Cheng, M.H. Hon, J. Appl. Phys. 79 (1996) 8047.

Google Scholar

[13] Y.H. Cheng, B.K. Tay, Journal of Crystal Growth 252 (2003) 257.

Google Scholar

[14] J. Pelleg, L.Z. Zevin, and S. Lungo, Thin Solid Films 197 (1991) 117.

Google Scholar

[15] J. Pelleg, L.Z. Zevin, S. Lungo and N. Croitoru, Thin Solid Films 169 (1989) 117.

Google Scholar

[16] U.C. Oh and Jung Ho Je, J. Appl. Phys. 74(3) 1993, 1692.

Google Scholar

[17] Edzo Zoestbergen, X-ray Analysis of Protective Coatings, Thesis, Rijksuniversiteit Groningen, (2000).

Google Scholar

[18] J. H. Je, D. Y. Noh, H. K. Kim and K. S. Liang, J. Appl. Phys. 81 (9) (1997) 6126.

Google Scholar

[19] L. Hultmann, J. -E. Sundgren, J. Appl. Phys. 66 (1989) 536.

Google Scholar

[20] W. D. Callister, Jr. Materials Science and Engineering An Introduction, 6th Ed. John Wiley & Sons, Inc. (2003).

Google Scholar