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Neutralization of Ion Beams for Reduction of Charging Damage in Plasma Etching

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Abstract:

Neutral beams were proposed for plasma etching in order to reduce damage due to charging. We analyzed the efficiency of neutralization in a system proposed recently where a beam of ions was neutralized in the gas phase and in a set of narrow tubes. We studied surface neutralization as well as collisions of ions in the gas. In the case of collisions of ions with aperture walls, efficiency of neutralization was assumed to be 100%. We also investigated the influence of various parameters such as aperture length, tube diameter and initial ion energy on the efficiency of neutralization using a Monte Carlo code for ion motion simulation. In our calculations we used a well-established set of cross sections for argon.

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Periodical:

Materials Science Forum (Volume 494)

Pages:

297-302

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.494.297

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Online since:

September 2005

Authors:

Aleksandra Nina, M. Radmilović-Radjenović, Z.Lj. Petrović

Keywords:

Charging, Etching, Nanotechnology, Neutral Particle Etching, Neutralization Efficiency, Ultra Large Scale Integrated Technologies

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© 2005 Trans Tech Publications Ltd. All Rights Reserved

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