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Ultra Clean Processing of Silicon Surfaces

Solid State Phenomena Volumes 65 - 66

• Papers
• Abstracts

• p253 Infrared Absorption Studies of Wet Chemical Oxides: Thermal Evolution of Impurities   [ 225 K ]
  Authors: Y.J. Chabal, M.K. Weldon, A.B. Gurevich, S.B. Christman
• p257 X-Ray Photoelectron Study of Gate Oxides and Nitrides   [ 162 K ]
  Authors: R.L. Opila, Jane P. Chang, M. Du, J. Bevk, Yuanqing Ma, M. Weldon, Y. Chabal, A.B. Gurevich
• p261 Evaluation of C₃F₈ as an In-Situ Cleaning Gas for PECVD Tools   [ 225 K ]
  Authors: R. Van San, L. Zazera
• p267 Generation at Point-of-Use of BHF   [ 384 K ]
  Authors: Steven Verhaverbeke, L.H. Liu
• p271 Characterization of HF Cleaning of Ion-Implanted Si Surfaces   [ 224 K ]
  Authors: E. Kondoh, Mikhail R. Baklanov, Karen Maex
• p275 Determination of SC1 Etch Rates at Low Temperatures with Microscope Interferometry   [ 198 K ]
  Authors: W. Storm, H.A. Gerber, G.-F. Hohl, M. Naujok, R. Schmolke
• p279 Impact of Trace Metals in Litho Chemicals   [ 188 K ]
  Authors: Rita Vos, Marcel Lux, Marc Meuris, Paul W. Mertens, Marc M. Heyns, R. Ramage
• p283 Post Metal Etch Polymer Removal: An Investigation of Parameters that Influence Corrosion   [ 292 K ]
  Authors: Werner Boullart, G. Mannaert, S. Graham, C. Tarassenko, L. Mouche
• p287 A Process Using Ozonated Water Solutions to Remove Photoresist after Metallization   [ 196 K ]
  Authors: S.L. Nelson, L.E. Carter
• p291 The Optimization of the Cleaning to Remove Residual Bonds of Si-C and Si-F after Fluorocarbon Plasma Etch on the Silicon Surface   [ 238 K ]
  Authors: Y.B. Kim, Mikhail R. Baklanov, Thierry Conard, Serge Vanhaelemeersch, W. Vandervorst