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Polycrystalline Semiconductors V

Solid State Phenomena Volumes 67 - 68

• Papers
• Abstracts

• p211 Fine-Crystalline Silicon Grown at Low Temperatures: Investigations by High-Resolution Microscopy   [ 606 K ]
  Authors: Ch. Ross, J. Herion, L. Houben, Reinhard Carius, H. Wagner
• p217 Study of Polysilicon Produced by Solid Phase Crystallization of Hydrogenated Amorphous Silicon Deposited at High Rate   [ 304 K ]
  Authors: G. Farhi, M. Aoucher, T. Mohammed-Brahim
• p223 Polycrystalline Silicon Films Produced by Low Pressure Chemical Vapour Deposition for Microswitch Applications: The Stress as Dependent on Deposition Conditions, Doping Type, and Thermal Treatments   [ 228 K ]
  Authors: Sandrine Lucas, K. Kis-Sion, J. Penven, O. Bonnaud, J. Pinel
• p229 Ultrathin Quasi-Monocrystalline Silicon Films for Electronic Devices   [ 403 K ]
  Authors: T.J. T.J. Rinke, R.B. Bergmann, R. Brüggemann, Jens Werner
• p237 Atomic Layer Deposition of ZnO Films and Their Application to Solar Cells   [ 634 K ]
  Authors: A. Yamada, Makoto Konagai
• p249 Properties of Transparent Conducting Indium Tin Oxide Films Deposited by Reactive e-Beam Evaporation on Heated Glass   [ 298 K ]
  Authors: G. Sinno, C. Minarini, S. Loreti, G. Di Francia, A. Salluzzo
• p255 Large Area Device Quality Indium-Tin-Oxide Thin Films by Magnetron Sputterting   [ 315 K ]
  Authors: P. Thilakan, E. Terzini, G. Nobile, S. Loreti, C. Minarini, T. Polichetti, G. Sasikala
• p261 Ion Assisted Reactive Magnetron Sputtering as a Deposition Method for High Quality Thin Films of Compound Semiconductors   [ 448 K ]
  Authors: K. Ellmer
• p269 Structure and Properties of TiO₂ Thin Films for Gas Sensors   [ 373 K ]
  Authors: F. Edelman, A. Rothshild, Y. Komem, V. Mikhelashvili, A. Chack, F. Cosandey
• p277 Texture Etched Aluminium Doped Zinc Oxide-Structural and Electrical Properties   [ 427 K ]
  Authors: A. Löffl, H. Kerber, H.-W. Schock, O. Kluth, L. Houben, B. Rech, H. Wagner