Si₃N₄: Stacking Faults
a.277

Si₃N₄: Surface Reconstruction
a.278

Si₃N₄/Si: Interface Defects
a.279

TaN: Cu Grain Boundary Diffusion
a.280

Ag₂O-TeO₂-AgI: Ionic Conduction
a.282

Al₂BeO₄, (Ga,Sc)₅Gd₃O₁₂: Dislocations
a.283

Al₄Bi₂O: Ionic Conduction and Point Defects
a.284

Al₂O₃: Cu, Fe, O Diffusion and Ion Implantation
a.285