HOME CONTACT

Username: Password:

> @scientific.net

Ultra Clean Processing of Silicon Surfaces

Solid State Phenomena Volumes 76 - 77

• Papers
• Abstracts

• p43 Improved Phosphoric Acid Mixtures for Nitride Strip   [ 222 K ]
  Authors: Rita Vos, Marcel Lux, Thierry Conard, H. De Witte, Paul W. Mertens, Marc M. Heyns, Z. Hatcher
• p47 Silicon Wafer Cleaning Processes Monitoring by the Surface Charge Profiler Method   [ 204 K ]
  Authors: Adrien Danel, Pascal Besson, T. Lardin, F. Tardif
• p51 New Aqueous Clean for Aluminum Interconnects: Part II. Applications   [ 201 K ]
  Authors: R. Ravikumar, D.L. Rath, D.J. Delehanty, R.G. Filippi, E.W. Kiewra, G. Stojakovic, K.J. McCullough, D.D. Miura, J. Gambino, F. Schnabel, B.N. Rhoads
• p55 Synchronous Schlieren Image Analysis of Megasonic Single Wafer Cleaning   [ 188 K ]
  Authors: Takashi Azuma, Akihiro Tomozawa, Hideo Kinoshita, Shin-ichiro Umemura
• p59 Dry Cleaning of Organic Contamination on Silicon Wafers Using Rapid Optical Surface Treatment   [ 226 K ]
  Authors: Adrien Danel, Névine Rochat, M. Olivier, A. Roche, F. Tardif
• p63 Materials Compatibility and Organic Build-Up during Ozone-Based Cleaning of Semiconductor Devices   [ 155 K ]
  Authors: F. De Smedt, Stefan De Gendt, Marc M. Heyns, Chris Vinckier
• p67 Surface Characterization after Different Wet Chemical Cleans   [ 225 K ]
  Authors: Martine Claes, Erika Röhr, Thierry Conard, F. De Smedt, Stefan De Gendt, W. Storm, T. Bauer, Paul W. Mertens, Marc M. Heyns
• p71 A Hydrogenated Water Application to Semiconductor Manufacturing   [ 188 K ]
  Authors: Ikunori Yokoi, Geun Min Choi, Yoshio Yamazaki, Tadahiro Ohmi
• p75 Investigation of Trace Metals Analyses of Dry Residue on Silicon Wafer Surfaces by TXRF and ICP-MS   [ 250 K ]
  Authors: Jiang Bo Wang, M. Balazs, Piero Pianetta, K. Baur, S. Brennan
• p81 Electrochemical Study for the Characterization of Wet Silicon Oxide Surfaces   [ 219 K ]
  Authors: V. Bertagna, R. Erre, F. Rouelle, M. Chemla, Sébastien Petitdidier, Didier Lévy