Ultra Clean Processing of Silicon Surfaces
Solid State Phenomena Volumes 76 - 77
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p85
Pre-Diffusion Cleaning Using Ozone and HF
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333 K
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Authors: Eric Bergman, Sebastien Lagrange, Martine Claes, Stefan De Gendt, Erika Röhr -
p89
Novel Back Side Processes for Copper and Pre-Lithography Cleans
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621 K
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Authors: Brian Aegerter, Sebastien Lagrange, Curt Dundas, Patrick Van Doorne -
p93
Optimisations of SC-1 Conditions for Sub 0.18μm Technologies in an Industrial Environment
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230 K
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Authors: Sébastien Petitdidier, H. Bernard, Enrico Bellandi, F. Landa, H. Shirakawa, Didier Lévy -
p97
Reduced Water Consumption for Post Clean Treatment and Metal Ion Contamination on VLSI Structures
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191 K
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Authors: Robert Small, Zhe Fei Chen, Cherry Wang, Becky Hon -
p101
Post SiN Etching Cleaning During Copper and Low K Integration
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268 K
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Authors: Alessio Beverina, Didier Louis, C. Arvet, E. Lajoinie, Pascal Besson, C. Peyne, Douglas Holmes, D. Maloney, S. Lee, W.M. Lee -
p105
Wet Preparation of Defect-Free Hydrogen-Terminated Silicon Wafer Surface and Its Characterization in Atomic-Scale
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458 K
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Authors: Takayuki Takahagi, Shozo Shingubara, Hiroyuki Sakaue -
p111
Detection and Identification of Organic Contamination on Silicon Substrates
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253 K
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Authors: A. Roche, S. Marthon, J.F. Ple, Névine Rochat, Adrien Danel, M. Olivier, M. Juhel, F. Tardif -
p115
Preparation and Characterization of Time Dependent Haze on Silicon Surfaces
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292 K
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Authors: N. Münter, B.O. Kolbesen, W. Storm, Timo Müller -
p119
Single Chemistry Cleaning Solution for Advanced Wafer Cleaning
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195 K
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Authors: Rita Vos, O. Doll, A. Fester, B.O. Kolbesen, Marcel Lux, Karine Kenis, Bart Onsia, S. Degendt, E. Schellkes, Z. Hatcher, Paul W. Mertens, Marc M. Heyns -
p123
Behaviors of Metallic Contaminants in Si Wafer Processing
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177 K
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Authors: Joong S. Jeon, Stefan De Gendt, Srini Raghavan, Marcia Almanza-Workman, Cynthia Gonsalves, Bob Ogle
