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Diffusion in Materials DIMAT2000

Defect and Diffusion Forum Volumes 194 - 199

• Papers
• Abstracts

• p635 Diffusion and Solubility of Iridium in Silicon   [ 312 K ]
  Authors: S. Obeidi, Nicolaas Stolwijk
• p641 Self Interstitials, Vacancies and Oxygen Atoms in CZ Silicon   [ 161 K ]
  Authors: Takahisa Okino, Toshitada Shimozaki, Chan Gyu Lee
• p647 Preliminary Results of Numerical Profiles for the Simultaneous Diffusion of Boron and Point Defects in Silicon using Irreversible Thermodynamic Theory   [ 315 K ]
  Authors: Dao Khac An, Vu Ba Dung
• p653 Computer Calculations of the Enhanced Diffusivity and Effective Activation Energy from Measured Profiles of Impurites in Silicon   [ 357 K ]
  Authors: Dao Khac An
• p659 Diffusion of Implanted ¹⁹⁵Au Radiotracer Atoms in Amorphous Silicon under Irradiation with 1 Mev-N⁺ Ions   [ 323 K ]
  Authors: T. Voss, P. Scharwaechter, W. Frank, Isolde Collaboration
• p667 Diffusion Creep of Silicon during Direct Silicon Wafer Bonding   [ 295 K ]
  Authors: E. Belyakova, N. Shmidt, V.V. Ratnikov, Alex A. Kamanin, Eun Dong Kim, Sang Cheol Kim
• p673 Self-Assembled Impurity Superlattices and Microcavities in Silicon   [ 401 K ]
  Authors: N.T. Bagraev, A.D. Bouravleuv, W. Gehlhoff, L.E. Klyachkin, A.M. Malyarenko, S.A. Rykov
• p679 Low Temperature Impurity Diffusion into Large-Band-Gap Semiconductors   [ 349 K ]
  Authors: N.T. Bagraev, A.D. Bouravleuv, A.A. Gippius, L.E. Klyachkin, A.M. Malyarenko
• p687 Hybrid Impurity and Self-Diffusion in GaAs and Related Compounds: Recent Progress   [ 834 K ]
  Authors: Nicolaas Stolwijk, G. Bösker, J. Pöpping
• p703 Boron Diffusion in Strained and Relaxed Si_1-xGe_x   [ 357 K ]
  Authors: N.R. Zangenberg, J. Fage-Pedersen, J. Lundsgaard Hansen, Arne Nylandsted-Larsen