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Polycrystalline Semiconductors VI

Solid State Phenomena Volumes 80 - 81

• Papers
• Abstracts

• p83 Poly-Crystallized SiGe Thin Films in a Low-Temperature Process   [ 222 K ]
  Authors: Takashi Noguchi
• p89 Effect of Pressure and Temperature on the Electrical Properties of LPCVD Silicon-Germanium Thin Films   [ 293 K ]
  Authors: Denis Guillet, M. Sarret, H. Lhermite, O. Bonnaud
• p95 Intra-Grain Defects - Limiting Factor for Low-Temperature Polycrystalline Silicon Films?   [ 360 K ]
  Authors: Thomas A. Wagner, L. Oberbeck, R.B. Bergmann, Jens Werner
• p101 Structural Effects in Ultra-Thin Iridium Silicide   [ 344 K ]
  Authors: U. Hörmann, T. Remmele, C. Schür, M. Albrecht, Horst P. Strunk, H. Grünleitner, M. Schulz
• p109 Hydrogen Diffusion through Deformed Si-Si Bonds at Grain Boundaries in Hot-Wire CVD Polycrystalline Silicon Films   [ 368 K ]
  Authors: Jatindra K. Rath, Ruud E.I. Schropp, W. Beyer
• p115 Point Defects in Carbon-Rich Polycrystalline Silicon   [ 333 K ]
  Authors: B. Pivac, Igor Kovačević, V. Borjanović
• p121 Hydrogen Penetration into Si under Wet Chemical Etching: Experiment and Simulation   [ 283 K ]
  Authors: O.V. Feklisova, E.B. Yakimov, Nikolai Yarykin
• p127 Comparison of Deposited Polycrystalline Films and Crystallized Silicon from a-Si:H Films   [ 252 K ]
  Authors: G. Farhi, R. Cherfi, M. Aoucher, K. Zellama
• p133 Visible Electroluminescence from an ITO/ZnS:Mn/n-Si Device   [ 305 K ]
  Authors: Takashi Hirate, Makoto Ueda, Tomomasa Satoh
• p139 Properties Presented by Tin Oxide Thin Films Deposited by Spray Pyrolysis   [ 234 K ]
  Authors: Patrícia Nunes, Elvira Fortunato, Paula M. Vilarinho, Rodrigo Martins