Ultra Clean Processing of Silicon Surfaces VII
Solid State Phenomena Volumes 103 - 104
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p227
Chromium Contamination in Silicon: Detection and Impact on Oxide Performances
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360 K
]
Authors: Maria-Luisa Polignano, Daniele Caputo, F. Cerutti, M. Cottini, L. Farini, J. Reffle -
p233
Further Reduction of Trace Level Ion from Ultra Pure Water and Its Effect on Electrical Property of Device
[
327 K
]
Authors: Toru Umeda, Shuichi Tsuzuki, Ryouji Kokuun, Kazuko Yoneda -
p237
Prevention of Copper Cross-Contamination on Cu Process and Non-Cu Process Mixed Fabrication
[
334 K
]
Authors: Joon Bum Shim, Kang Hyun Lee, Kee Ho Kim, Heung Soo Park -
p241
Wafer Backside Cleaning Strategies for High-k/Metal Gate Processing
[
306 K
]
Authors: Rita Vos, E. Kesters, Sylvain Garaud, R. De Waele, Karine Kenis, Marcel Lux, H. Kraus, J. Snow, D. Shamiryan, Gabriela Catana, W. Deweerd, T. Schram, S. DeGendt, Paul W. Mertens -
p245
Direct Mixing Cleaning Method of Aqua Regia on Wafer
[
88 K
]
Authors: Hajime Ugajin, Hayato Iwamoto, Kei Kinoshita -
p249
Single Backside Cleaning on Silicon, Silicon Nitride and Silicon Oxide
[
104 K
]
Authors: Lucile Broussous, Pascal Besson, M.M. Frank, D. Bourgeat -
p255
The Degradation Prevention of Resin Materials for Semiconductor Manufacturing Equipment by Applying the Ultra-High Purity Gas Supply Technology
[
298 K
]
Authors: Atsushi Hidaka, Satoru Yamashita, Naoki Tanahashi, Hidekazu Ishii, Masafumi Kitano, Yasuyuki Shirai, Tadahiro Ohmi -
p259
Measurement and Control of Airborne Molecular Contamination during Wafer Storage and Transport
[
185 K
]
Authors: Daniel Alvarez, Allan Tram, Russell J. Holmes -
p265
Purification of Trace Amount of Metal Impurity from Ultra Pure Water Using Membrane Purifier/Filter
[
295 K
]
Authors: Yukio Hashimoto, Mutsuhiro Amari, Makoto Komatsu, Kunio Fujiwara -
p269
Metal Contamination on Silicon Surfaces from Solvents
[
190 K
]
Authors: Twan Bearda, Ief Vander Mot, Kristel Van den Broeck, Nausikaä Van Hoornick, Jan Van Hoeymissen, Paul W. Mertens
