Cobalt Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method Using C<sub>12</sub>H<sub>10</sub>O<sub>6</sub>(Co)<sub>2</sub> and CpCo(CO)<sub>2</sub>

Materials Science & Technology

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Cobalt Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method Using C₁₂H₁₀O₆(Co)₂ and CpCo(CO)₂

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