Ultra Clean Processing of Semiconductor Surfaces VIII
Solid State Phenomena Volume 134
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p221
The Removal of Silica Particles from Micron Wide Trenches by Megasonic Cleaning
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200 K
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Authors: Kurt Wostyn, Vincent Quenette, Guy Vereecke, Paul W. Mertens -
p225
Is there Gas Entrapped on Submerged Silicon Wafers? Visualizing Nano-Scale Bubbles with Cavitation
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1 M
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Authors: Bram Borkent, Nicolas Bremond, Manish Arora, Claus Dieter Ohl, Detlef Lohse -
p229
Acoustic Field Analysis of a T Type Waveguide in Single Wafer Megasonic Cleaning and its Effect on Particle Removal
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837 K
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Authors: Yang Lae Lee, Eui Su Lim, Kook Jin Kang, Hyun Se Kim, Tae Gon Kim, Sang Ho Lee, Jin Goo Park -
p233
Study of the Dynamics of Local Particle Removal Efficiencies Using Localized Haze Maps
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314 K
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Authors: Tom Janssens, Frank Holsteyns, Karine Kenis, Sophia Arnauts, Twan Bearda, Kurt Wostyn, Gavin Simpson, Andy Steinbach, Paul W. Mertens -
p237
Effect of Ozone Supply Methods on PRE in Alkaline Ozone Solutions
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759 K
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Authors: Seung Ho Lee, Tae Gon Kim, Tae Young Kwon, Jin Goo Park, So Ik Bae, Gun Ho Lee, In Jung Kim -
p243
Challenges of Single-Wafer Wet Cleaning for Low Temperature Pre-Epitaxial Treatment of SiGe
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216 K
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Authors: K. Sano, F.E. Leys, G. Dilliway, R. Loo, Paul W. Mertens, J. Snow, Akira Izumi, Atsuro Eitoku -
p247
Estimation of Detrimental Impact of New Metal Candidates in Advanced Microelectronics
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180 K
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Authors: Yannick Borde, Adrien Danel, A. Roche, A. Grouillet, Marc Veillerot -
p251
Plastic Containers Contamination by Volatile Acids : Accumulation, Release and Transfer to Cu-Surfaces during Wafers Storage
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146 K
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Authors: Hervé Fontaine, Marc Veillerot -
p255
A Study on Germanium as a Contaminant Source in Semiconductor Fabrication Process
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135 K
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Authors: Dong Won Hwang, Jae Seok Lee, Pil Kwon Jun, Yang Ku Lee, Seung Ki Chae -
p259
Implementation of a System for Metal Contamination Control Based on Classification Criteria
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147 K
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Authors: Twan Bearda, Gabriela Catana, David Hellin, Rita Vos
