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Ultra Clean Processing of Semiconductor Surfaces VIII

Solid State Phenomena Volume 134

• Papers
• Abstracts

• p263 Study of Static Electricity in Wafer Cleaning Process   [ 163 K ]
  Authors: M. Wada, T. Sueto, H. Takahashi, N. Hayashi, Atsuro Eitoku
• p269 Mapping of Metallic Contamination Using TXRF   [ 392 K ]
  Authors: Adrien Danel, Yannick Borde, Marc Veillerot, Nicolas Cabuil, H. Kono, M. Yamagami
• p273 Investigation of Metallic Contamination Analysis Using Vapor Phase Decomposition – Droplet Collection – Total Reflection X-Ray Fluorescence (VPD-DC-TXRF) for Pt-Group Elements on Silicon Wafers   [ 208 K ]
  Authors: David Hellin, Nick Valckx, Jens Rip, Stefan De Gendt, Chris Vinckier
• p277 X-Ray Spectrometry for Wafer Contamination Analysis and Speciation as Well as for Reference-Free Nanolayer Characterization   [ 4 M ]
  Authors: Burkhard Beckhoff, R. Fliegauf, Michael Kolbe, M. Müller, B. Pollakowski, J. Weser, Gerhard Ulm
• p281 Advanced Metrologies for Cleans Characterization: ARXPS, GIXF and NEXAFS   [ 166 K ]
  Authors: Thierry Conard, Scott List, Martine Claes, Burkhard Beckhoff
• p285 Advanced TXRF Analysis: Background Reduction when Measuring High-k Materials and Mapping Metallic Contamination   [ 235 K ]
  Authors: Chris Sparks, Joel Barnett, Diane K. Michelson, Carolyn Gondran, Seung Chul Song, Angela Martinez, Hikari Takahara, Hiroyuki Murakami, Toru Kinashi
• p289 Novel Full Wafer Inspection Technology for Non-Visual Residue Defects   [ 2 M ]
  Authors: Robert Bryant, Joel Hickson, Jeff Hawthorne
• p295 A Study on Water-Mark Defects in Copper/Low-k Chemical Mechanical Polishing   [ 497 K ]
  Authors: Ja Hyung Han, Ja Eung Koo, Kyo Se Choi, Byung Lyul Park, Ju Hyuk Chung, Sang Rok Hah, Sun Yong Lee, Young Jae Kang, Jin Goo Park
• p299 Effect of an Organic Inhibitor in High pH Chemical Rinse on the Platen for Cu-CMP   [ 190 K ]
  Authors: Sébastien Petitdidier, Kyle Bartosh, Chantal Trouiller, Alexandre Couvrat, Jun Liu, Mark Zaleski
• p303 The Dependence of Chemical Mechanical Polishing Residue Removal on Post-Cleaning Treatments   [ 1 M ]
  Authors: Jae Gon Choi, Hyo Geun Yoon, Woo Jin Kim, Geun Min Choi, Young Wook Song, Jin Goo Park