Paper Title:
Property Comparison of CuInSi Films Prepared by Multilayer Synthesized and Magnetron Co-Sputtering
  Abstract

Using magnetron sputtering technology, the CuInSi nanocomposite thin films were prepared by magnetron co-sputtering method and multilayer synthesized method respectively,and followed by annealing in N2 atmosphere at different temperatures. The structure of CuInSi nanocomposite films were detected by X-ray diffraction (XRD); X-ray diffraction studies of the annealed films indicate the presence of CuInSi, the peak of main crystal phase is at about 2θ=42.308°,meanwhile,there are In2O3 peak and other peaks in the XRD patterns of films. The morphology of the film surface was studied by SEM. The SEM images show that the crystalline of the film prepared by multilayer synthesized method was granulated, But the crystalline of the film prepared by magnetron co-sputtering with needle shape. The grain size is a few hundred angstroms. The band gap has been estimated from the optical absorption studies and found to be about 1.40 eV for the sample by magnetron co-sputtering, and 1.45eV for the sample by multilayer synthesized, but all changes with the purity of CuInSi.

  Info
Periodical
Chapter
Chapter 19: Nanofabrication, Nanometrology and Applications
Edited by
Wu Fan
Pages
3755-3761
DOI
10.4028/www.scientific.net/AMM.110-116.3755
Citation
J. S. Xie, J. H. Li, P. Luan, "Property Comparison of CuInSi Films Prepared by Multilayer Synthesized and Magnetron Co-Sputtering", Applied Mechanics and Materials, Vols. 110-116, pp. 3755-3761, 2012
Online since
October 2011
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Wan Li Zhang, Hong Chuan Jiang, Bin Peng, Wen Xu Zhang, Shi Qing Yang
Abstract:In this paper, the influences of annealing temperature on TbFe magnetostrictive film magnetic and magnetostrictive characteristics were...
3741
Authors: Jian Sheng Xie, Ping Luan, Jin Hua Li
Chapter 9: Composite Materials II
Abstract:Using magnetron sputtering technology, the CuInSi nanocomposite thin films were prepared by multilayer synthesized method. The structure of...
2770
Authors: Ching Fang Tseng, Yun Pin Lu, Hsin Han Tung, Pai Chuan Yang
Chapter 3: Electrical, Magnetic and Optical Ceramics
Abstract:This paper describes physical properties of (Ca0.8Sr0.2)TiO3 were deposited by sol-gel method with a fix per-heating temperature of 400oC for...
1171
Authors: S.A. Aly
Abstract:A Vanadium Pentoxide Sample with a Film Thickness of 75 Nm Has Been Thermally Evaporated on Unheated Glass Substrate Using...
139
Authors: Tai Long Gui, Si Da Jiang, Chun Cheng Ban, Jia Qing Liu
Chapter 2:Advanced Material Science and Technology
Abstract:AlN dielectric thin films were deposited on N type Si(100) substrate by reactive radio frequency magnetron sputtering that directly...
409