Paper Title:
Characterization of Capacitively Coupled Radio-Frequency Argon Plasma by Electrical Circuit Simulation
  Abstract

Low temperature radio frequency plasma is widely used in low temperature plasma processing medium for material processing in many fields including microelectronics, aerospace, and the biology. For proper utilization of the process, it is very much important to know the plasma parameters. In this paper a novel technique is used to determine the plasma parameters from the electrical discharge characteristic and the power balance method. The homogeneous discharge model is used to evaluate the relation between the plasma parameters with the discharge characteristics. The electron density and temperature is found to be well agree with the Langmuir probe data in the range of 0.5x1016 to 45x1016 cm-3 and 1.4 to 1.6 ev for wide range of rf power.

  Info
Periodical
Chapter
Chapter 24: Semiconductor Materials Manufacturing
Edited by
Wu Fan
Pages
5373-5379
DOI
10.4028/www.scientific.net/AMM.110-116.5373
Citation
B. Bora, H. Bhuyan, M. Favre, E. Wyndham, H. Chuaqui, "Characterization of Capacitively Coupled Radio-Frequency Argon Plasma by Electrical Circuit Simulation", Applied Mechanics and Materials, Vols. 110-116, pp. 5373-5379, 2012
Online since
October 2011
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Zhi Wen Wu, Shu Shu, Da Ren Yu, Xiang Yang Liu, Ning Fei Wang
Abstract:The wall material plays an important role for the electron current due to near wall conductivity in Hall Thrusters. A Monte Carlo method...
519
Authors: Peng Sun, Rong Ni Yan
Chapter 19: Modeling, Analysis, and Simulation of Manufacturing Processes II
Abstract:Three-dimensional magnetohydrodynamic(MHD) model of vacuum arc was built based on two-fluid model of ion and electron and Maxwell equation....
4843
Authors: Yun Xia Chen, Guo Hua Li, Xiao Jing Wang
Chapter 15: Materials Processing Technology
Abstract:The equipment for measuring electron beam (EB) focus in electron beam produced by the effect of extremum temperature of powder molten pool...
1779
Authors: Fei Yan, Zhong Cai Yuan, Yong Wang, Shi Lian Gong, Zheng Li
Chapter 3: Electrotechnics and Electrical Machines
Abstract:This paper presents numerical results in the form of graphs of the power reflection coefficients for electromagnetic signals normally...
941
Authors: Jiang Fan Liu, Guo Bin Wan, Jin Sheng Zhang, Xiao Li Xi
Chapter 6: Electronic and Radio Engineering
Abstract:The electromagnetic simulation software CST was used to analyze the effects of reentry plasma sheath on the GPS navigation antenna. The...
1614