Paper Title:
Plasma Assisted Deposition Technology of Optical Coating
  Abstract

Plasma assisted deposition technology with an advanced plasma source and its application in the field of optical coating fabrication are investigated. In this paper, MgF2, Al2O3 and TiO2 single layer films are prepared by this technology, and the measure results show that they all have good optical parameter.

  Info
Periodical
Edited by
Honghua Tan
Pages
463-467
DOI
10.4028/www.scientific.net/AMM.29-32.463
Citation
X. H. Rong, C. X. Li, X. Y. Zhang, Y. M. Wang, W. L. Wang, "Plasma Assisted Deposition Technology of Optical Coating", Applied Mechanics and Materials, Vols. 29-32, pp. 463-467, 2010
Online since
August 2010
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