Paper Title:
Deposition of Nitrogen-Doped TiO2 Films on Unheated Substrates Using DC Magnetron Sputtering Technique
  Abstract

The optimal process conditions for preparing nitrogen-doped titanium oxide (N-TiO2) films on unheated glass slides were investigated at various nitrogen (N2) flow rates. Films were found to exhibit significant polycrystalline structure, mainly the anatase phase with pyramid-like surface morphology. The X-ray photoelectron spectroscopy spectra confirmed the presence of the N2 within the TiO2 crystal lattice, resulting in a narrower band gap and in a red shift of the absorption into the visible-light region. N-doping of the TiO2 crystal lattice changed the oxidation state of Ti from Ti+4 to Ti+3, resulting in the formation of titanium oxynitride (TiOxNy) in the films. Our films displayed an enhanced ability to degrade a methyl blue solution illuminated with visible-light at wavelengths up to 500 nm. Among the samples tested, the N-TiO2 film that was deposited at a flow rate of 25 sccm N2 was found to be the most active photocatalyst.

  Info
Periodical
Edited by
Yuanzhi Wang
Pages
85-90
DOI
10.4028/www.scientific.net/AMM.39.85
Citation
K. R. Wu, C. H. Hung, C. C. Wang, H. W. Li, "Deposition of Nitrogen-Doped TiO2 Films on Unheated Substrates Using DC Magnetron Sputtering Technique", Applied Mechanics and Materials, Vol. 39, pp. 85-90, 2011
Online since
November 2010
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