Paper Title:
Characteristic Analysis of Plasma Arc Adjusted by a Magnetic Field
  Abstract

The image collecting devices, which consist of optical lens, neutral density filter, narrow-band interference filter, CCD and the other equipments are set up to collect the images of plasma arc column with and without external transverse alternating magnetic field (ETAMF). On the basis of de-noising and enhancing morphological characteristics to the collected images, the characteristics of plasma arc with and without ETAMF are analyzed comparatively. The results show that the application of ETAMF is capable to get oscillation of plasma arc, and change its location, shape and heat flux density distribution, which can get efficiently control in the width of heated area and flatten heat flux density of workpiece surface.

  Info
Periodical
Edited by
Ran Chen
Pages
1812-1816
DOI
10.4028/www.scientific.net/AMM.44-47.1812
Citation
J. Sun, W. J. Xu, C. Y. Wang, "Characteristic Analysis of Plasma Arc Adjusted by a Magnetic Field", Applied Mechanics and Materials, Vols. 44-47, pp. 1812-1816, 2011
Online since
December 2010
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$32.00
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