Paper Title:
Polishing Mechanism and Technology of Hard Disk Substrates by Colloidal Silica Alkaline Slurry
  Abstract

Chemical mechanical polishing (CMP) has been a widely applied process for nickel-phosphorus (Ni-P) coating hard disk substrate polishing. In this study, colloidal silica-based alkaline slurry was prepared for polishing Ni-P plated substrates and its CMP mechanism was studied with alkali slurry. Effects of the various process parameters such as polishing pressure and plate speed on hard disk substrate were investigated. The results show that the polishing pressure and plate speed have a strong influence on the material removal rate and surface roughness of the hard disk substrate. The oxidization layer formed on hard disk substrate surface after polishing. The nickel ions were bounded with amidocyanogen to form stable and soluble macromolecular amidocyanogen-complex agent, improved selectivity of convex region and concave region, enhanced the chemical reaction uniformity and the mass transfer velocity, and thus high removal rate and low surface roughness could be realized.

  Info
Periodical
Edited by
Ran Chen
Pages
3072-3076
DOI
10.4028/www.scientific.net/AMM.44-47.3072
Citation
S. L. Wang, Z. X. Li, L. B. Yang, Y. Tian, H. L. Mu, "Polishing Mechanism and Technology of Hard Disk Substrates by Colloidal Silica Alkaline Slurry", Applied Mechanics and Materials, Vols. 44-47, pp. 3072-3076, 2011
Online since
December 2010
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$32.00
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