Paper Title:
Effects of Substrate Temperature on ZAO Thin Film Prepared by DC Reactive Magnetron Sputtering
  Abstract

The effects of substrate temperature on the resistivity and transmittance of ZAO thin films prepared by DC magnetron reactive sputtering have been investigated. The properties of the samples have been analyzed through Hall effect, X-ray diffraction and SEM. The results show that carrier concentration, Hall mobility and crystallinity of the films depend obviously on the deposition temperature. The film deposited at the range 200-250°C has lower resistivity and higher transmittance.

  Info
Periodical
Edited by
Zhenyu Du and Bin Liu
Pages
376-380
DOI
10.4028/www.scientific.net/AMM.65.376
Citation
F. Lu, C. H. Xu, "Effects of Substrate Temperature on ZAO Thin Film Prepared by DC Reactive Magnetron Sputtering", Applied Mechanics and Materials, Vol. 65, pp. 376-380, 2011
Online since
June 2011
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