Paper Title:
Fabrication of TiO2 Films on Glass Substrates by a Pulsed Dc Reactive Magnetron Sputtering
  Abstract

Due to its ability of photocatalysis and photoinduced superhydrophilicity, TiO2 was paid significant attentions in recent years. In this study, TiO2 films were deposited at room temperature and 300 °C by pulsed dc reactive magnetron sputtering. The gas pressure was varied in the range of 0.3-1.1 Pa by filling Ar/N2 gas mixture with the ratio of 1:1. The surface morphologies, phase structure and optical property of the TiO2 films were investigated. TiO2 films with good crystalline quality containing mainly of anatase phase were obtained by deposition using gas pressure of 0.7 Pa at room temperature and gas pressure of 1.5 Pa at 300 °C.

  Info
Periodical
Chapter
Chapter 8: Frontiers of Construction Information
Edited by
Dongye Sun, Wen-Pei Sung and Ran Chen
Pages
5050-5053
DOI
10.4028/www.scientific.net/AMM.71-78.5050
Citation
Q. M. Wang, T. F. Zhang, S. H. Kwon, K. H. Kim, "Fabrication of TiO2 Films on Glass Substrates by a Pulsed Dc Reactive Magnetron Sputtering", Applied Mechanics and Materials, Vols. 71-78, pp. 5050-5053, 2011
Online since
July 2011
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$32.00
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