Paper Title:
Design of Applied Diffusion Pump System for Electron Beam Process
  Abstract

Efficiency of vacuumizing is vital to process time with electron beam. The system principle of vacuum system was designed based on the analysis of system request. The workflow of vacuum system was established and its characteristic was introduced. The controlling theory and circuit of vacuum system was designed while vacuum device was made and its performance was tested. The vacuum system was acquired which was suitable to electronic beam.

  Info
Periodical
Chapter
Chapter 9: Information System for Materials and Mechanics
Edited by
Linli Xu, Wenya Tian and Elwin Mao
Pages
1295-1299
DOI
10.4028/www.scientific.net/AMM.80-81.1295
Citation
Y. Jin, J. J. Hu, H. B. Xu, "Design of Applied Diffusion Pump System for Electron Beam Process", Applied Mechanics and Materials, Vols. 80-81, pp. 1295-1299, 2011
Online since
July 2011
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Price
$32.00
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