Paper Title:
Cr-Doped DLC Multilayered Thin Films Deposited Using Cathodic Vacuum Arc- and DC Magnetron-Assisted Ion Beam Sputtering
  Abstract

A series of graded films of Cr/CrN/ CrNC/CrC/(Cr-DLC)/[(Cr-(Cr-DLC))×10] were deposited on Si(100) wafer and 4135 alloy structural steel using cathodic vacuum arc technique and direct current magnetron sputtering method combined with ion beam sputtering. The surface morphology, microstructure, nano-hardness, adhesion and wear properties of the films were investigated using 3-dimensional white-light interfering surface profiler, scanning electron microscopy, nanoindentation, scratch adhesion test, ball-on-disc test, etc. It was measured that the as-prepared Cr-doped DLC multilayered thin films have a strong adhesion to the substrates with a critical load exceeding 80 N, and the average friction coefficient during 30 min test in air was 0.23. This film will be promising in application against wear.

  Info
Periodical
Advanced Materials Research (Volumes 105-106)
Edited by
Wei Pan and Jianghong Gong
Pages
429-431
DOI
10.4028/www.scientific.net/AMR.105-106.429
Citation
X. C. Chen, Z. J. Peng, Z. Q. Fu, C. B. Wang, "Cr-Doped DLC Multilayered Thin Films Deposited Using Cathodic Vacuum Arc- and DC Magnetron-Assisted Ion Beam Sputtering", Advanced Materials Research, Vols. 105-106, pp. 429-431, 2010
Online since
April 2010
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