Paper Title:
Anodic Oxidation Parameters on Al-Cu Alloy Anodizing Film's Electrochemical Ability by EIS
| Periodical | Advanced Materials Research (Volumes 11 - 12) |
|---|---|
| Main Theme | AICAM 2005 |
| Edited by | Masayuki Nogami, Riguang Jin, Toshihiro Kasuga and Wantai Yang |
| Pages | 665-668 |
| DOI | 10.4028/www.scientific.net/AMR.11-12.665 |
| Citation | Chao Guo et al., 2006, Advanced Materials Research, 11-12, 665 |
| Online since | February, 2006 |
| Authors | Chao Guo, Yu Zuo, Jing Mao Zhao, Xu Hui Zhao, Jin Ping Xiong |
| Keywords | Anodized Oxidation, Cast Al-Cu Alloy, Electrochemical Impedance Spectroscopy (EIS), Equivalent Circuit |
| Price | US$ 28,- |
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Abstract
EIS is used in this paper to study the effects of anodic oxidation parameters on the film’s ability, and multi-layer equivalent circuits are proposed. The oxidation time has great effect on porous layer, the porous layer’s impedance increases as the anodic oxidation time prolong; anodic current density has effect on both barrier layer and porous layer, higher current density gets higher impedance values in both barrier layer and porous layer; anodic oxidation temperature has great effect on barrier layer, when the temperature decreases, the barrier layer’s impedance increases.