Paper Title:
Block Copolymers on a Physically or Chemically Patterned Substrate
  Abstract

Patterned substrates are good candidates to enhance the arrangement of nanodomains in block copolymer thin films. Here, I theoretically demonstrate the possibility to self-assemble block copolymers on top of physically or chemically patterned substrates. The presence of substrate pattern not only enhances the alignment of polymers, but also induces novel new morphologies which were not present in the bulk phase diagram.

  Info
Periodical
Advanced Materials Research (Volumes 123-125)
Edited by
Joong Hee Lee
Pages
523-526
DOI
10.4028/www.scientific.net/AMR.123-125.523
Citation
J. U. Kim, "Block Copolymers on a Physically or Chemically Patterned Substrate", Advanced Materials Research, Vols. 123-125, pp. 523-526, 2010
Online since
August 2010
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