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Mechanical Characterization of Lapping Plate Materials in Diamond Charging Process

Journal Advanced Materials Research (Volumes 126 - 128)
Volume Advances in Abrasive Technology XIII
Edited by Yunn-Shiuan Liao, Chao-Chang A. Chen, Choung-Lii Chao and Pei-Lum Tso
Pages 17-22
DOI 10.4028/www.scientific.net/AMR.126-128.17
Citation Hideaki Tanaka et al., 2010, Advanced Materials Research, 126-128, 17
Online since August, 2010
Authors Hideaki Tanaka, Hiromu Chiba, Takehisa Yoshikawa, K. Iwatsuka, Yukio Maeda
Keywords Atomic Force Microscope (AFM), Charging, Fixed Abrasive, Lapping, Plate Material, Work-Hardening
Abstract

In the lapping of magnetic heads and other electronic components composed of multiple materials, differences in the processing characteristics of the composite materials result in “residual steps” forming on the surface at composite interfaces. Residual step heights have been reduced to as little as a few nanometers. We investigated using fine abrasives in fixed abrasive lapping for this purpose, which requires highly secure, high-density embedding of the abrasives on the lapping plate. To this end, we modeled the abrasive embedding process and investigated the relationship between the mechanical properties of the lapping plate and the retention of the abrasive, to determine the direction of further research and development. The results of this investigation revealed a correlation between the work hardening in the plate and the resulting abrasive density and cutting edge height. The investigation also showed that it is possible to suppress the reduction in lapping rate that occurs during use by increasing the work hardening coefficient of the plate.

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