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Effect of Wheel Arrangement on Ground Surface Topography in Horizontal-Axis-Type Rotary Surface Grinding

Journal Advanced Materials Research (Volumes 126 - 128)
Volume Advances in Abrasive Technology XIII
Edited by Yunn-Shiuan Liao, Chao-Chang A. Chen, Choung-Lii Chao and Pei-Lum Tso
Pages 579-584
DOI 10.4028/www.scientific.net/AMR.126-128.579
Citation Akihiko Kubo et al., 2010, Advanced Materials Research, 126-128, 579
Online since August, 2010
Authors Akihiko Kubo, Junichi Tamaki, A.M.M. Sharif Ullah
Keywords Cross Grinding, Ground Surface Topography, Horizontal-Axis-Type Rotary Surface Grinding, Parallel Grinding, Silicon Wafer, Tungsten Carbide
Abstract

Two grinding methods, parallel grinding and cross grinding, were applied to the horizontal-axis-type rotary surface grinding of silicon and tungsten carbide. It was found that the cross grinding method results in better ground surface roughness than parallel grinding for the silicon wafer and that an isotropic ground surface topography is achieved for both silicon and tungsten carbide by cross grinding.

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