Paper Title:
Improvement in Oxide-Pattern Sizes Controllability on Scanning Probe Nanolithography
  Abstract

Pattern size controllability of SPM-based nano-lithography especially in vertical direction was improved using in-situ height and depth measurements at the processed point. The transient oxide growth was monitored by light transmission (depth of the oxide in sample metal surface) and topographical signals measurements obtained from a scanning near-field optical microscope. First, we investigated oxidizing rate limitation on titanium film. At the voltage rise faster than 10 V/sec, the depth growth didn’t follow the voltage change in spite of immediate upheaval growth. This result suggested the rate determining of reactive chemicals transport in the titanium oxide. Next, we discovered improvement in the process stability on intractable materials (e.g. iron group elements or noble metals; manganese in this paper) by using thin cap layer of titanium. As the result, the oxidization reaction progressed moderately due to the facts that the oxide of the cap layer is electrical insulative and restriction of the permeability of the reactive chemicals (ingredients of the oxide) that were electrochemically generated at apex of the probe tip.

  Info
Periodical
Advanced Materials Research (Volumes 126-128)
Edited by
Yunn-Shiuan Liao, Chao-Chang A. Chen, Choung-Lii Chao and Pei-Lum Tso
Pages
701-706
DOI
10.4028/www.scientific.net/AMR.126-128.701
Citation
T. Onuki, T. Tokizaki, H. Ojima, J. Shimizu, L. B. Zhou, "Improvement in Oxide-Pattern Sizes Controllability on Scanning Probe Nanolithography", Advanced Materials Research, Vols. 126-128, pp. 701-706, 2010
Online since
August 2010
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: A.M. Hoff, E. Oborina, Stephen E. Saddow, A. Savtchouk
1349
Authors: Antonella Poggi, Francesco Moscatelli, Andrea Scorzoni, Giovanni Marino, Roberta Nipoti, Michele Sanmartin
Abstract:Many investigations have been conducted on the growth conditions of SiO2 on SiC to improve the oxide quality and the properties of the...
979
Authors: Jae Kwang Lee, Yun Ho Shin, Jin Wook Kang, Yong Sug Tak
Abstract:The effect of chemical pretreatments on the electrochemical etching behavior of aluminum was investigated with the topographic studies of...
1561
Authors: Zhi Guo Ye, Xian Liang Zhou, Hui Min Meng, Xiao Zhen Hua, Ying Hu Dong, Ai Hua Zou
New Energy Materials
Abstract:Nanostructured elements, including: manganese-molybdenum (Mn-Mo) oxide, manganese-molybdenum-tungsten (Mn-Mo-W) oxide,...
1290
Authors: Ye Bo Lu, Masumi Saka
Chapter 2: Material Engineering and Technology
Abstract:The effect of surface film on the Al whisker fabrication by utilizing stress migration was investigated. The sample was a thin aluminum film...
110