Paper Title:
Ultra Smooth Planarization Polishing Technique Based on the Cluster Magnetorheological Effect
  Abstract

A new planarization polishing method based on the cluster magnetorheological (MR) effect is presented to polish optical glass in this paper. Some process experiments were conducted to reveal the influence of the content of carbonyl iron and the abrasive materials in the MR fluid on the machining effect, and the machining characteristic of polished surface was studied. The results indicate that the surface roughness of the polished workpiece can be reduced rapidly when the strong magnetic field is applied, and ultra smooth surface with Ra 1.4 nm can be achieved while the CeO2 abrasives are used in the MR fluid. The content of carbonyl iron obviously influences the machining effect of this planarization polishing method based on cluster MR-effect. With the increase of the content of carbonyl iron in the MR fluid, the material removal rate improves and the surface roughness reduces rapidly. However, the difference of abrasive material results in various machining effects. As for the K9 optical glass, the CeO2 abrasive is better polishing abrasive than the SiC abrasive in the planarization polishing technique based on the cluster MR-effect.

  Info
Periodical
Edited by
Qiusheng Yan, Jiabin Lu, Jun Wang and Hang Gao
Pages
18-23
DOI
10.4028/www.scientific.net/AMR.135.18
Citation
Q. S. Yan, J. W. Yan, J. B. Lu, W. Q. Gao, "Ultra Smooth Planarization Polishing Technique Based on the Cluster Magnetorheological Effect ", Advanced Materials Research, Vol. 135, pp. 18-23, 2010
Online since
October 2010
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Yong Bo Wu, Kunio Shimada
Abstract:This paper deals with the machining of quartz wafers using an MCF (Magnetic Compound Fluid) polishing liquid, frozen with liquid nitrogen....
187
Authors: Suo Xian Yuan, Yun Xia Hao
Abstract:In recent years, the demands on product performance are improving, particularly in the aviation; electronics, precision instruments and other...
713
Authors: Qian Fa Deng, Ping Zhao, Bing Hai Lv, Ju Long Yuan, Zhi Wei Wang
Chapter 1: Grinding Technology
Abstract:Abrasive machining is an important process for the manufacturing of advanced ceramics. The demand for advanced ceramics with better quality...
251
Authors: Mahadev Gouda Patil, Kamlesh Chandra, Prabhu Shankar Misra
Chapter 5: Powder Metallurgy and Plastic Deformation
Abstract:Abstract: The magnetic abrasive finishing (MAF) process which was introduced during the late 1940s has emerged as an important...
1577
Authors: Jian Xiu Su, Jia Xi Du, Xing Long Liu, Hai Na Liu
Abstract:SiC crystal substrate has been widely used in the area of microelectronics, photonics and new materials, such as semiconductor lighting,...
250