Tradition lithographic techniques to produce micrlens array are complicated and time consuming. Due to the capability to replicate nanostructures repeatedly in a large area with high resolution and uniformity, hot embossing has been recognized as one of the promising approaches to fabricate microlens array with high throughput and low cost. This paper introduces processes to realize fabricating microlens array in mass production by direct hot embossing on silicon substrate. The mold is fabricated by multi-photolithography and etching steps and polymethyl methacrylate (PMMA) is chosen as the resist. Processes include coating, heating, pressing, etc. Fidelity and optical performance of the embossed microlens array were measured. High fidelity and fine optical performance of the embossed microlens array demonstrate the possibility of hot embossing to fabricate microlens array in mass production.