Paper Title:
351nm Excimer Large-Area Lithography by Scanning and Projection
  Abstract

For the system of a large-area laser projection image exposure using 351nm XeF excimer, its constitution, optical design parameters, and manufacturing process are introduced. The system is capable of patterning in photoresists for large-format products, with feature sizes ranging from 10 µm to below 1µm and substrate sizes ranging from 100×100mm to 600×900mm. 351nm excimer is used in this system because of its capability for exposure of conventional photoresists. Large-area lithography refers to the patterning on such areas with the desired resolution and seamless scanning. Along with the demands for lithography equipment that can provide high-resolution imaging capability, high-precision alignment performance and lower manufacturing costs, it is important for us to design and manufacture such equipment. Some key problems such as laser illumination optics, projection optics, positioning and controlling machinery, are described here. The existing problem and solutions in the optics and machinery are analyzed and discussed.

  Info
Periodical
Advanced Materials Research (Volumes 139-141)
Edited by
Liangchi Zhang, Chunliang Zhang and Tielin Shi
Pages
758-761
DOI
10.4028/www.scientific.net/AMR.139-141.758
Citation
J. Y. Zhou, Q. Ouyang, Q. H. Lin, W. Y. Pei, "351nm Excimer Large-Area Lithography by Scanning and Projection", Advanced Materials Research, Vols. 139-141, pp. 758-761, 2010
Online since
October 2010
Export
Price
$32.00
Share

In order to see related information, you need to Login.

In order to see related information, you need to Login.

Authors: Chien Hua Lin, Ti Kuang Hou, Dong Cherng Wen
Abstract:Electromagnetic optical scanning mirrors for both horizontal and vertical scanning of a Laser Projection Display have been proposed....
601
Authors: Xin Xing Wang, Jin Yun Zhou, Liang Lei, Qing Hua Lin, Ying Shi, Long Hua Mei
Laser Processing Technology
Abstract:As the higher and higher demand for image definition of flat-panel display (FPD), the minimum linewidth of pixel electrode, which is based on...
1910
Authors: Yan He Chang, Chun Shui Jin, Chun Li, Jing Cheng Jin
Chapter 2: Fabrication
Abstract:ArF excimer laser is the main light resource for the microlithography technology. In the laser cavity, the optical components with lowest...
252
Authors: A.F.M. Anuar, Yufridin Wahab, M.Z. Zainol, H. Fazmir, M. Najmi, M. Mazalan, M.K. Md Arshad
Abstract:A simple theoretical model and resistor fabrication for calculating the resistance of a polycrystalline silicon thin film is presented. The...
17