Effects of Process Parameters on the Adhesion of Sputtering Protective Coating of Gd
| Periodical | Advanced Materials Research (Volumes 148 - 149) |
|---|---|
| Main Theme | Manufacturing Processes and Systems |
| Edited by | Xianghua Liu, Zhengyi Jiang and Jingtao Han |
| Pages | 633-639 |
| DOI | 10.4028/www.scientific.net/AMR.148-149.633 |
| Citation | Xiao Qiu Zheng et al., 2010, Advanced Materials Research, 148-149, 633 |
| Online since | October, 2010 |
| Authors | Xiao Qiu Zheng, Shi Kun Xie, Rong Xi Yi |
| Keywords | Adhesion, Interference, Magnetron Sputtering, Orthogonal Experiment, Refrigerant material |
| Price | US$ 28,- |
In order to research the adhesion of sputtering protective coating of Gd.Gd substrates were differently coated with Cu and Al by means of DC magnetron sputtering technology. The characteristics of the films were investigated by scanning electron microscopy (SEM), EDS, and the adhesions of films were tested by tension test. The results show that the films of Al are smooth and perfect, the interferences between Al and Gd join together strongly, and the largest strength of adhesion is 27.6MPa in these tests on the optimize parameters through orthogonal experimental design. While the films of Cu are rough and bad, the interferences between Cu and Gd join together loosely, and the largest strength of adhesion is only 3.02MPa in these tests on the optimize parameters through orthogonal experimental design.
