Paper Title:
Influence of Substrate Temperature on Structure and Optical Property of Cu3N Thin Films
  Abstract

Copper nitride thin films were prepared by reactive radio frequency magnetron sputtering at various substrate temperatures. The surface morphology and crystal structure of the thin films were characterized by atomic force microscope (AFM) and X-ray diffraction (XRD), respectively. The AFM images demonstrate that the films have a compact structure. The XRD test indicates that growth orientation of the thin films prefers the (111) or (100) at different substrate temperature. The optical transmission properties of the thin films were obtained by an ultraviolet visible spectrometer. The optical band gap of the thin films decreases with increasing substrate temperature.

  Info
Periodical
Advanced Materials Research (Volumes 152-153)
Edited by
Zhengyi Jiang, Jingtao Han and Xianghua Liu
Pages
218-221
DOI
10.4028/www.scientific.net/AMR.152-153.218
Citation
J. R. Xiao, A. H. Jiang, Y. G. Liang, "Influence of Substrate Temperature on Structure and Optical Property of Cu3N Thin Films", Advanced Materials Research, Vols. 152-153, pp. 218-221, 2011
Online since
October 2010
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Price
$32.00
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