Paper Title:
Preparation and Investigation of Hydrophobic Mesoporous Silica Films
  Abstract

A novel route to prepare hydrophobic mesoporous SiO2 films is reported in this paper. A two step process involving tetraethyl orthosilicate (TEOS) as a precursor and cetyltrimethyl ammonium bromide (CTAB) as a template prepared SiO2 sol catalyzed by hydrochloric acid. The films are prepared by dip-coating process. It has been found that the films have low dielectric constant and good mechanical properties. Preliminary results present a very positive prospective for intermetal dielectric applications.

  Info
Periodical
Advanced Materials Research (Volumes 152-153)
Edited by
Zhengyi Jiang, Jingtao Han and Xianghua Liu
Pages
856-859
DOI
10.4028/www.scientific.net/AMR.152-153.856
Citation
Y. J. Cao, Z. F. Wu, "Preparation and Investigation of Hydrophobic Mesoporous Silica Films", Advanced Materials Research, Vols. 152-153, pp. 856-859, 2011
Online since
October 2010
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Price
$32.00
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