Paper Title:
Investigation on the Structure and Properties of TiAlN Coatings Deposited by DC Reactive Magnetron Sputtering
  Abstract

TiAlN coatings have been deposited by reactive magnetron sputtering from TiAl alloy target using a direct current (DC) power source. The crystal structure, chemical composition, surface morphology and hardness of TiAlN coatings which were prepared at various N2 flow rates have been systemically investigated. The results show a strong effect of N2 flow rates on the orientation, grain size and densification in TiAlN coatings. The TiAlN coating shows the highest hardness at a certain N2 flow rate when it has the most compact structure.

  Info
Periodical
Advanced Materials Research (Volumes 154-155)
Edited by
Zhengyi Jiang, Xianghua Liu and Jinglong Bu
Pages
1639-1642
DOI
10.4028/www.scientific.net/AMR.154-155.1639
Citation
X. Wang, K. Zhang, G. H. Yue, D. L. Peng, Z. B. Qi, Z. C. Wang, "Investigation on the Structure and Properties of TiAlN Coatings Deposited by DC Reactive Magnetron Sputtering", Advanced Materials Research, Vols. 154-155, pp. 1639-1642, 2011
Online since
October 2010
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$32.00
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