Paper Title:
Initial Electrodeposition Behavior of Amorphous Ni-P Alloys
  Abstract

The growth morphology and structure of deposits during the initial stages of amorphous Ni-P electrodeposition was studied using atomic force microscopy (AFM), X-ray diffraction (XRD) and transmission electron microscope (TEM). Combined electrochemical and surface analytical measurements showed that the electrocrystallization process follows a three-dimensional instantaneous nucleation and growth mechanism. The structure of the Ni-P deposits progressively changed from polycrystalline to amorphous state with increasing electroplating time. Additional electrodeposition was carried out on amorphous carbon film at potential -650mV (SCE) for 5s in the same bath for plating Ni-P alloy. It was confirmed that the formation of crystal Ni at initial stage of electroplating Ni-P amorphous alloy was not caused by the epitaxial relationship between the crystal Ni and the crystal substrate and there was a nucleation process in the electrodeposition of amorphous alloy.

  Info
Periodical
Advanced Materials Research (Volumes 154-155)
Edited by
Zhengyi Jiang, Xianghua Liu and Jinglong Bu
Pages
535-539
DOI
10.4028/www.scientific.net/AMR.154-155.535
Citation
X. T. Yuan, D. B. Sun, Z. Q. Hua, L. Wang, "Initial Electrodeposition Behavior of Amorphous Ni-P Alloys", Advanced Materials Research, Vols. 154-155, pp. 535-539, 2011
Online since
October 2010
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Price
$32.00
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