With the development of mobile communications, gallium arsenide integrated circuits (GaAs IC) have been widely used. For example, satellite communication technology, satellite TV, wireless data transmission, fiber optic communications equipment, automatic test equipment etc. At the same time, it demands that the GaAs chips should have high quality surfaces. In this paper, it takes non-abrasive cryogenic polishing technique to polish GaAs chip surfaces. It has recorded the actual measurement results. The results show that the surface roughness of the ice disk polishing can achieve nanometer scale. Through the research of non-abrasive cryogenic polishing, it has analyzed different parameters on the impact of surface quality.