Paper Title:
Effects of Sputtering Parameters on the Properties of Sputtered ZnO Films
  Abstract

The ZnO films were deposited on quartz glass substrate by RF magnetron sputtering. The influences of the deposition power, the Ar/O2 ratio and the total press on the crystallinity of ZnO films were analyzed by X-ray diffraction. The results show that the films deposited at Ar/O2 ratio of 2:3 have better crystalline quality under our experimental conditions. The optimum power is about 120-160 W. The crystal structure was significantly influenced by the total pressure in the chamber. The total press should below 1 Pa in order to get high quality ZnO films.

  Info
Periodical
Advanced Materials Research (Volumes 160-162)
Edited by
Guojun Zhang and Jessica Xu
Pages
1541-1544
DOI
10.4028/www.scientific.net/AMR.160-162.1541
Citation
B. Huang, H. D. Yang, "Effects of Sputtering Parameters on the Properties of Sputtered ZnO Films", Advanced Materials Research, Vols. 160-162, pp. 1541-1544, 2011
Online since
November 2010
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Price
$32.00
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